New
APSY-ELO600 MACHINE
Description
he system is equipped with two chambers. The first chamber incorporates an electron gun and is equipped with cryogenic pumping. The second chamber is isolated from the first, it is equipped with its own cryogenic pump. We find there the rotating substrate holder of 720mm in diameter and a system of engraving by linear ion source.
The deposition and etching uniformity rate is less than ±5% on 6 inch wafers.
The ion cannon extracts linearly to make room for evaporation.
The system is entirely controlled by a PLC/HMI unit, SIEMENS.
specifications
All our new systems are guaranteed for two years, on-site interventions within 48 hours, remote maintenance. Preventive maintenance at the end of the warranty period.
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Cryogenic pump CT8 and CT10
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Edwards GSX250 primary pump
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Absolute pressure gauges MKS 974B and pirani 925
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Canon à électron TELEMARK STIH-3CK, 6 x 25cc. Power supply 10Kw
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Evaporation flow shutter
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Deposit control by quartz balance and Inficon XTC3 controller
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Rotation system from 1 to 20 rpm, dome Ø 700mm
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DC Ion Source VEECO 60 x 300mm. Beam energy 100-1500eV
supervising
The functions of the program provide a permanent support for monitoring the progress of the actions carried out by the system, in the form of graphic and dynamic representation, events or even curves.
Different user levels are available. Each of them permit a secure access and use according to the user.
Each action, alarm or feedback is associated with a textual description of different levels, blocking or not.
These events are stored in the log.
The general interface gives you as much visible data as possible. Of type, pressures, powers, movements, statuses of the various subsets of the system, etc.
Several user functions are available: production, manual, cycles and maintenance.
dimensions
System size :
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Height : 2200mm.
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Width : 1600mm.
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Profundity : 2000mm.
Chamber dimensions :
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Height : 762mm.
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Width : 862mm.
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Profundity : 1050mm.
