Very versatile sputtering system, which allows the deposition of a thin dielectric or metallic layer. It allows in RF or DC on three cathodes to have very high deposition rates with always a very good uniformity on substrates positioned horizontally. The vertical positioning provide the processing of parts of various sizes and shapes, up to 20mm thick.
The ApSy-P603 is optimized for research and production, it has two substrate holder (pallet) operation. While the deposit is made on one, the others degasses in the airlock. Several options allow the preparation of the substrate, such as heating, etching.
The system is entirely controlled by a PLC/HMI assembly.
The functions of the program provide permanent support for monitoring the progress of the actions carried out by the system, in the form of graphic and dynamic representation, events or even curves.
Different user levels are available. Each of them controls access and secure use according to the user.
Each action, alarm or feedback is associated with a textual description of different levels, blocking or not.
These events are stored in the history.
The general interface gives you as much visible data as possible. Of type, pressures, powers, movements, statuses of the various subsets of the system, etc.
Several user functions are available: production, manual, cycles and maintenance.